Optical Materials Characterization Laboratory

The Optical Materials Characterization Laboratory engages in research on optical materials for high-energy laser systems, non-linear processes, photolithography, extreme environments as well as stressing situations in the laboratory or controlled environments. We can measure and analyze materials at different temperatures and environments for nearly all physical parameters required by component designers/users as well as system engineers for scientific, military or space applications and systems.

Our current work concentrates on materials and coatings for high powered lasers in the mid-infrared. The lab’s capabilities extend from the ultra-violet to the far infrared. We have a suite of source/sensors which is currently operational from .6328 microns, [0.812, 1.064, 1.15, 1.319] to 3.39 microns. Soon to be on-line again are 10.6 and possibly 5.4 microns. We also have the capability to operate and test at HF (~2.8mm) as well as DF (~3.8mm). We are quite proud of the fact that this laser has been continually operational for a period of nearly 20 years. Other non-standard wavelengths may also be used to interrogate materials for unusual properties displayed at band edges, for example.

To learn more about some of our specific capabilities, please contact Taaro Mandre at 937-229-5147.

• Laser calorimetry  (extinction coefficient, bulk absorption, surface absorption) 
• Stress optic effects 
• dn/dT 
• Total integrated scattering
• Angle-resolved scattering