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Division:
Nonstructural Materials

Facilities:
Surface Analysis Laboratory
NEST Laboratory


Thomas Wittberg Photo
 
  Thomas N. Wittberg

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Research Physicist
Surface Analysis Lab

Address:
Kettering Laboratories, Rm. 562
300 College Park
Dayton OH 45469-0152
937-229-3001
fax 937-229-3433

Thomas Wittberg has more than 25 years of experience with the surface analysis techniques of Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS).  His expertise with these techniques is documented by more than 35 publications in refereed scientific journals describing applications to studies of corrosion, adhesion, diffusion, oxidation and thermionic emission.

Mr. Wittberg routinely uses AES and XPS to solve problems for numerous industrial clients.  For a number of years he has used XPS to study the oxidation of silicon carbide and silicon nitride ceramic materials in conjunction with scientists from the National Institute of Standards and Technology (NIST).

Education:

B.S., Physics and Mathematics, University of Dayton, 1976

Affiliations:

AVS Science and Technology Society
Past president, AVS Ohio Chapter

Selected Publications:

“Characterization of aluminum nitride thin films deposited by filtered cathodic arc process,” S.J. Dixit, A.K. Rai, R.S. Bhattacharya, S. Guha, and T. Wittberg, Thin Solid Films, 17, 398-399, (2001).
“Solid lubrication of silicon nitride with cesium-based compounds: Part II – Surface analysis,” Lewis Rosado, Nelson H. Forster and Thomas N. Wittberg, Tribology Transactions 43, 521 (2000).
“XPS study of the dehydration of clay and kaolin powders,” T.N. Wittberg and Pu Sen Wang, Surf. Interface Analysis 27, 936 (1999).
"The oxidation of an aluminum nitride powder studied by bremsstrahlung-excited Auger electron spectroscopy and x-ray photoelectron spectroscopy," Pu Sen Wang, Subhas G. Malghan, Stephen M. Hsu and Thomas N. Wittberg, J. Mater. Res. 10, (1995).
"X-ray induced AES study of the effect of chemically bound hydrogen on the oxidation kinetics of an Si3N4 powder," Pu Sen Wang, Subhas G. Malghan, Stephen M. Hsu and Thomas N. Wittberg, Surf. Interface Analysis 21, 155 (1994).
 "Effects of *-silicon nitride powder processing on surface oxidation kinetics," Pu Sen Wang, Subhas G. Malghan, Stephen M. Hsu and T. N. Wittberg,  J. Mater. Res. 8, 3168 (1993).
 "Oxidation of surface-treated SiC platelets studied by XPS and bremsstrahlung-excited AES," Pu Sen Wang, Subhas G. Malghan, Stephen M. Hsu and T. N. Wittberg, Surf. Interface Analysis 20, 105 (1993).
 "Barium adsorption on nickel: Auger electron spectroscopy and work-function measurements," T. N. Wittberg, J. Vac. Sci. Technol. A9, 2400 (1991).
“XPS analysis of silane coupling agents and silane-treated E-glass fibers,” Carlo G. Pantano and T. N. Wittberg, Surf. Interface Analysis 15, 498 (1990).
“An Auger sputter profiling study of nitrogen and oxygen ion implantations in two titanium alloys,” B. D. Barton, L. E. Pope and T. N. Wittberg, Surf. Interface Analysis 15, 100 (1990).



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